Research

Film thickness measurement plays an important role in thin film manufacturing, chip manufacturing, and integrated circuits. Optical combs have the advantages of a broad spectrum and the ability to achieve absolute distance measurement, while dual-comb systems, composed of two combs with a small repetition rate, can achieve rapid measurement. The spectroscopic interferometric ellipsometry system that eliminates interference from back-reflected light and the simplified dual-comb system without the need for synchronization locking, both by this research group, can achieve high-precision measurement of film thickness and are expected to be applied in fields such as semiconductor inspection.